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    KDF(USA)-900series     
        903NT, 943NT, 943NTX, 954NT and 954NTX
                                        



   

 

 

Designed to meet today's stringent production requirements, the 900Series offers process flexibility typically found in R&D systems. The 900Series surpasses the criteria for deposition of thin films in application critical devices and other applications requiring the absolute in uniformity.

¡ß Horizontal cathode and substrate orientation for gentle substrate fixturing
    and varied substrate sizes

¡ß 12×12-inch substrate area

¡ß Capacity to process dimensional substrates up to 1.5-inch thick.

¡ß High-rate DC magnetron sputtering and single or multiple -pass deposition features

¡ß Capacity to process up to one 300mm wafers or multiple smaller wafers at a time

¡ß High-speed batch processing

¡ß Convenient wafer to pallet loading ability

¡ß Optional high vacuum loadlock configuration

¡ß Optional planetary substrate pallet provides unsurpassed film uniformity


The 900 Series system can be equipped with KDF's exclusive and innovative ERPP¢â(enhanced rotary planetary pallet), which provides greatly improved wafer uniformities. In tandem with KDF's cathodes, this pallet option can achievebetter than +/- 1% uniformities across the pallet and better than 0.5% repeatabilities between runs for dielectrics such as SiO2 and TiO2, compared with traditional pallet uniformities of +/- 15-20% for such materials.

The 900Series family also features a special application Focest Cathode¢â,originally developed


                           
                                                                                                             
 
Enlarged view
                                             In line with your process

The most reliable in-line sputtering tools in the industry are developed and manufactured by KDF. All of KDF's systems are engineered to meet versatility and high throughput demands across a number of markets at the industry's lowest cost of ownership :

¡ß Mainstram silicon                                         ¡ß Emerging materials

¡ß Flat panel display                                         ¡ß Optical communications

Across all platforms, KDF's in-line batch sputtering systems are easier to use and maintain than cluster tools. KDF's solutions provide users with increased :

¡ß Film uniformity                                              ¡ß Throughput

¡ß Process stability                                            ¡ß ROI

¡ß Automation                                                    ¡ß Tool uptime

¡ß Reliability                                                     
 ¡ß Environmental health and safety benefits



                                                                   


 

 
 

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